Sökning: "ion beam etching"
Visar resultat 1 - 5 av 34 avhandlingar innehållade orden ion beam etching.
1. Ion beam etching of InP based materials
Sammanfattning : Dry etching is an important technique for pattern transferin fabrication of most opto-electronic devices, since it canprovide good control of both structure size and shape even on asub-micron scale. Unfortunately, this process step may causedamage to the material which is detrimental to deviceperformance. LÄS MER
2. Case Studies in Ion Beam Assisted Nanostructure Engineering
Sammanfattning : Beams of energetic ions can be used for material analysis and modification. It provides us with a tool featuring unique control over the area, depth and amount of damage in the material. This property of ion beams can be used to generate desired changes in material properties or form nanostructures with specific characteristics in the material. LÄS MER
3. Two-Dimensional Photonic Crystals in InP-based Materials
Sammanfattning : Photonic crystals (PhCs) are structures periodic in thedielectric constant. They exhibit a photonic bandgap, i.e., arange of wavelengths for which light propagation is forbidden. LÄS MER
4. Ion Tracks for Micro- and Nanofabrication : From Single Channels to Superhydrophobic Surfaces
Sammanfattning : A method is described for preset-count irradiations between 1 and 100 ions singling-out individual ions from an ion beam with more than a billion ions arriving per second. The ion tracks are etched in a conductometric system with real-time evaluation of the acquired data. The etch process can be interrupted when reaching a preset channel diameter. LÄS MER
5. Chemically assisted ion beam etching and properites of single electron traps in MOS structures
Sammanfattning : .... LÄS MER