Sökning: "dynamic material flow analysis"
Visar resultat 1 - 5 av 41 avhandlingar innehållade orden dynamic material flow analysis.
1. Image-based quantitative infrared analysis and microparticle characterisation for pulp and paper applications
Sammanfattning : Measurements of process variations and particle morphology are widely employed in the pulp and paper industry. Two techniques with high potential, infrared thermography and microparticle characterisation, are mainly used qualitatively. LÄS MER
2. Improved mapping of steel recycling from an industrial perspective
Sammanfattning : The results from this study show that it is possible to obtain data series on the steel scrap collection based on mass balance model on the crude steel production figures by steelmaking reactor type and additional knowledge on process metallurgy as well as information on inputs and outputs into the reactors with an area correlation coefficient of 0,91 compared to data obtained from trade statistics. Furthermore, the study shows that based on a new method it is possible to calculate the time duration of mass flows on a continuous basis. LÄS MER
3. A study of some aspects of gas-slag-metal interactions : Towards dynamic process model and control
Sammanfattning : The present thesis deals with the development of a new type of dynamic model for metallurgical reactors. It also covers some of the theoretical aspects of steelmaking that is necessary to include in such an application. The thesis consists of modeling work, high temperature experiments and cold model experiments. LÄS MER
4. Experiments and modelling of fracture initiation at impact
Sammanfattning : The thesis addresses different questions, each necessary in the understanding of dynamic fracture initiation and crack propagation in steel. Emphasis lays on dynamic crack propagation experiments performed in the ductile to brittle transition region and possible conclusions, that can be drawn from them. LÄS MER
5. Model-based Analysis and Design of Atomic Layer Deposition Processes
Sammanfattning : Atomic layer deposition (ALD) is a thin-film manufacturing process in which the growth surface is exposed to non-overlapping alternating injections of gas-phase chemical precursor species separated by intermediate purge periods to prevent gas-phase reactions. ALD is characterized by sequential self-terminating heterogeneous reactions between highly reactive gas-phase precursor species and surface-bound species which, when allowed sufficient conditions to reach saturation, results in highly conformal films, on both planar and topographically complex structures. LÄS MER