Sökning: "deposition conditions"
Visar resultat 21 - 25 av 438 avhandlingar innehållade orden deposition conditions.
21. Phenomena in laser based material deposition
Sammanfattning : This thesis is regarding the use of a laser beam to deposit material. Phenomena in two processes, laser beam welding with filler wire and blown powder directed energy deposition (DED) also known as laser metal deposition (LMD)1, are discussed. LÄS MER
22. Deposition and Resolution of AA Amyloid
Sammanfattning : Amyloidosis is a group of protein misfolding diseases characterized by extracellulardeposition of fibrillar protein aggregates. Today more than 25 different human amyloidogenicproteins have been identified, causing a variety of pathological conditions that includeAlzheimer’s disease, type 2 diabetes and prion diseases. LÄS MER
23. Laser metal fusion and deposition using wire feedstock : Process modelling and CFD simulation
Sammanfattning : Laser metal fusion is widely used in production technology to manufacture parts, as in welding, cladding, and additive manufacturing. In this study, conduction mode laser metal fusion is applied without and with metal deposition from a wire feedstock. LÄS MER
24. Chemical Vapour Deposition of Undoped and Oxygen Doped Copper (I) Nitride
Sammanfattning : In science and technology there is a steadily increased demand of new materials and new materials production processes since they create new application areas as well as improved production technology and economy. This thesis includes development and studies of a chemical vapour deposition (CVD) process for growth of thin films of the metastable material copper nitride, Cu3N, which is a semiconductor and decomposes at around 300 oC. LÄS MER
25. Fundamental aspects of HiPIMS under industrial conditions
Sammanfattning : Fundamental aspects of the high power impulse magnetron sputtering (HiPIMS) process and its implication for film growth under industrial conditions have been studied. The emerging HiPIMS technique exhibits a higher plasma density and an enhanced degree of ionisation of sputtered material as compared to conventional direct current magnetron sputtering (DCMS). LÄS MER