Sökning: "Ulf Helmersson"

Visar resultat 1 - 5 av 20 avhandlingar innehållade orden Ulf Helmersson.

  1. 1. Reactive High Power Impulse Magnetron Sputtering of Metal Oxides

    Författare :Montri Aiempanakit; Ulf Helmersson; Tomas Kubart; Straňák Vítězslav; Linköpings universitet; []
    Nyckelord :;

    Sammanfattning : The work presented in this thesis deals with reactive magnetron sputtering processes of metal oxides with a prime focus on high power impulse magnetron sputtering (HiPIMS). The aim of the research is to contribute towards understanding of the fundamental mechanisms governing a reactive HiPIMS process and to investigate their implications on the film growth. LÄS MER

  3. 2. HiPIMS-based Novel Deposition Processes for Thin Films

    Författare :Asim Aijaz; Ulf Helmersson; Kostas Sarakinos; Linköpings universitet; []
    Nyckelord :;

    Sammanfattning : In this research, high power impulse magnetron sputtering (HiPIMS) based new deposition processes are introduced to address; the issue of low degree of ionization of C in magnetron sputtering discharges, and the difficulty encountered in thin film deposition on complex-shaped surfaces. The issue of low degree of C ionization is addressed by introducing a new strategy which is based on promoting the electron impact ionization ofC by increasing the electron temperature in the plasma discharge using Ne, instead of conventionally used Ar. LÄS MER

  4. 3. Synthesis of Carbon-based and Metal-Oxide Thin Films using High Power Impulse Magnetron Sputtering

    Författare :Asim Aijaz; Ulf Helmersson; Kostas Sarakinos; Günter Bräuer; Linköpings universitet; []
    Nyckelord :;

    Sammanfattning : The work presented in this thesis deals with synthesis of carbon-based as well as metal-oxide thin films using highly ionized plasmas. The principal deposition method employed was high power impulse magnetron sputtering (HiPIMS). LÄS MER

  5. 4. Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering

    Författare :Jones Alami; Ulf Helmersson; James Bradley; Linköpings universitet; []
    Nyckelord :Highly ionized pulsed magnetron sputtering; HPPMS; HPPIMS; thin film; plasma analysis; Langmuir probe; TECHNOLOGY; TEKNIKVETENSKAP;

    Sammanfattning : The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). LÄS MER

  7. 5. Controlling the Formation and Stability of Alumina Phases

    Författare :Jon Martin Andersson; Ulf Helmersson; Eric Kay; Linköpings universitet; []
    Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; thin films; alumina; magnetron sputtering; phase stability; density functional theory; Material physics with surface physics; Materialfysik med ytfysik;

    Sammanfattning : In this work, physical phenomena related to the growth and phase formation of alumina, Al2O3, are investigated by experiments and computer calculations. Alumina finds applications in a wide variety of areas, due to many beneficial properties and several existing crystalline phases. LÄS MER