Avancerad sökning

Hittade 5 avhandlingar som matchar ovanstående sökkriterier.

1. 1. Formation of non-metallic inclusions and the possibility of their removal during ingot casting

   Författare :Lars Ragnarsson; Sichen Du; Carlo Mapelli; KTH; []
   Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Ingot casting; tool steel; inclusion; runner; refractory; erosion; casting powder; cold model; argon shroud; reoxidation; oxygen measurement; CFD; PIV; Metallurgical process engineering; Metallurgisk processteknik;

   Sammanfattning : The present study was carried out to investigate the formation and evolution of non-metallic inclusions during ingot casting. Emphasize have been on understanding the types of inclusions formed and developed through the casting process and on the development of already existing inclusions carried over from the ladle during casting. LÄS MER

3. 2. Deposition of high quality thin dielectrics on silicon

   Författare :Lars-Åke Ragnarsson; Chalmers tekniska högskola; []
   Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; oxynitride; metal-oxide-semiconductor capacitors; RPECVD; silicon dioxide; interfaces; si-SiO2; remote plasma-enhanced CVD; ONO; C-V; nitrided interfaces; SiO2; deposited dielectrics;

   Sammanfattning : .... LÄS MER

4. 3. Ultrathin Oxides in Metal-Oxide-Silicon Structures: Defects and Characterization

   Författare :Lars-Åke Ragnarsson; Chalmers tekniska högskola; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; PMA; interface state densities; silicon; aluminum oxide; Pb; ultrathin; RPECVD; MOS;

   Sammanfattning : The properties of metal-oxide-silicon (MOS) structures with ultrathin oxide layers (15-30 Å) have been investigated by means of electrical characterization. The characterization methods used were mainly capacitance voltage (C-V), current voltage (I-V) and constant voltage stress (I-t) measurements. LÄS MER

5. 4. Variations Related to Print Mottle in Starch-Containing Paper Coatings

   Författare :Micael Ragnarsson; Lars Järnström; Gunnar Engström; Martti Toivakka; Karlstads universitet; []
   Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; pigment coating; porosity variations; coating structure; coat weight variations; starch; dextrin; CMC; latex; print mottle; calendering; pilot coating; offset printing; Chemical Engineering; Kemiteknik;

   Sammanfattning : Starch in paper coatings is known to increase the risk of print mottle in lithographic offset printing. The objective of this study was to increase the understanding of this behaviour. LÄS MER

7. 5. Integration of thulium silicate for enhanced scalability of high-k/metal gate CMOS technology

   Författare :Eugenio Dentoni Litta; Per-Erik Hellström; Mikael Östling; Lars-Åke Ragnarsson; KTH; []
   Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; thulium; silicate; TmSiO; Tm2O3; interfacial layer; IL; CMOS; high-k; ALD; Informations- och kommunikationsteknik; Information and Communication Technology;

   Sammanfattning : High-k/metal gate stacks have been introduced in CMOS technology during the last decade in order to sustain continued device scaling and ever-improving circuit performance. Starting from the 45 nm technology node, the stringent requirements in terms of equivalent oxide thickness and gate current density have rendered the replacement of the conventional SiON/poly-Si stack unavoidable. LÄS MER