Sökning: "TiN films"

Visar resultat 1 - 5 av 82 avhandlingar innehållade orden TiN films.

  1. 1. Hollow Cathode Deposition of Thin Films

    Författare :Lars-Erik Gustavsson; Ladislav Bárdoš; Hana Baránková; Claes Nender; Uppsala universitet; []
    Nyckelord :Electronics; Hollow cathode; Hybrid plasma; PVD; TiN films; Ferromagnetic substrates; Magnetized plasma; CrN films; Elektronik;

    Sammanfattning : Thin films of metals and compounds have a very wide range of applications today. Many of the deposition methods used for the production of such films utilize plasma to support the growth the film, e.g. by the supply of energy and the enhancement of reactivity. LÄS MER

  3. 2. Electrical and optical properties of doped tin oxide films

    Författare :Bertil Stjerna; Chalmers tekniska högskola; []
    Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; thin films; resistivity; absorptance; optical properties; transmittance; wide bandgap semiconductor; electrical properties; ionized impurity scattering; oxygen vacancies; flourine; sputtering; antimony; tin oxide;

    Sammanfattning : .... LÄS MER

  4. 3. Lithium intercalation in tin oxide films : Physics and electrochemistry

    Författare :Jan Isidorsson; Uppsala universitet; []
    Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Materials science; Materialvetenskap; Materials science; Teknisk materialvetenskap; Solid State Physics; fasta tillståndets fysik;

    Sammanfattning : Tin oxide films were made by reactive rf magnetron sputtering under conditions that led to both electronic and ionic conductivity. It was found that a high sputter pressure promoted porosity and a high charge capacity. LÄS MER

  5. 4. High-resolution characterization of TiN diffusion barrier layers

    Författare :Marlene Mühlbacher; Lars Hultman; Christian Mitterer; Lars Johnson; Linköpings universitet; []
    Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Diffusion; TiN; Microstructure; Transmission electron microscopy; TEM; Atom probe tomography; APT;

    Sammanfattning : Titanium nitride (TiN) films are widely applied as diffusion barrier layers in microelectronic devices. The continued miniaturization of such devices not only poses new challenges to material systems design, but also puts high demands on characterization techniques. LÄS MER

  7. 5. MAX phase thin films : unique multifunctional ceramics with the elements Ti, Si, Ge, Sn, and C

    Författare :Jens Emmerlich; Wolfhard Möller; Linköpings universitet; []
    Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; Thin solid films; Single-crystal; Physics; Fysik;

    Sammanfattning : Mn+1AXn phases are ternary carbides or nitrides (X) consisting of an early transition metal (M), and (A)- group element (group III-V). They combine ceramic and metallic properties with high oxidation and thermal shock resistance as well as low resistivity. LÄS MER