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1. 1. High-resolution characterization of TiN diffusion barrier layers

   Författare :Marlene Mühlbacher; Lars Hultman; Christian Mitterer; Lars Johnson; Linköpings universitet; []
   Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Diffusion; TiN; Microstructure; Transmission electron microscopy; TEM; Atom probe tomography; APT;

   Sammanfattning : Titanium nitride (TiN) films are widely applied as diffusion barrier layers in microelectronic devices. The continued miniaturization of such devices not only poses new challenges to material systems design, but also puts high demands on characterization techniques. LÄS MER