Avancerad sökning
Visar resultat 1 - 5 av 33 avhandlingar som matchar ovanstående sökkriterier.
1. Fundamentals of High Power Impulse Magnetron Sputtering
Sammanfattning : In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. LÄS MER
2. Plasma properties in high power impulse magnetron sputtering
Sammanfattning : The work presented in this thesis involves experimental and theoretical studies related to plasma properties in high power impulse magnetron sputtering (HiPIMS), and more specifically plasma transport. HiPIMS is an ionized PVD method based on conventional direct current magnetron sputtering (dcMS). LÄS MER
3. Modeling High Power Impulse Magnetron Sputtering Discharges
Sammanfattning : HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot of attention ever since its appearance. A time-dependent plasma discharge model has been developed for the ionization region in HiPIMS discharges. LÄS MER
4. High power impulse magnetron sputtering under industrial conditions
Sammanfattning : In this thesis, the recent development step of magnetron sputtering, termed high power impulse magnetron sputtering (HiPIMS) has been studied. Compared to conventional magnetron sputtering HiPIMS provides a higher plasma density which can ionise the sputtered material. LÄS MER
5. Alumina Thin Films : From Computer Calculations to Cutting Tools
Sammanfattning : The work presented in this thesis deals with experimental and theoretical studies related to alumina thin films. Alumina, Al2O3, is a polymorphic material utilized in a variety of applications, e.g., in the form of thin films. LÄS MER