Sökning: "High Power Pulsed Magnetron Sputtering"

Visar resultat 1 - 5 av 13 avhandlingar innehållade orden High Power Pulsed Magnetron Sputtering.

  1. 1. Fundamentals of High Power Impulse Magnetron Sputtering

    Detta är en avhandling från Institutionen för fysik, kemi och biologi

    Författare :Johan Böhlmark; Linköpings universitet.; Linköpings universitet.; [2006]
    Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; Plasma; Pulsed plasma; High Power Pulsed Magnetron Sputtering; Plasma Characterization; NATURAL SCIENCES Physics; NATURVETENSKAP Fysik;

    Sammanfattning : In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. LÄS MER

  2. 2. Plasma characterisation in high power pulsed magnetron sputtering

    Detta är en avhandling från Linköping : Linköpings universitet

    Författare :Jones Alami; Linköpings universitet.; Linköpings universitet.; [2003]
    Nyckelord :NATURVETENSKAP; NATURAL SCIENCES;

    Sammanfattning : In this thesis, plasma parameters including plasma and floating potentials, electron energy distribution function (EEDF) plasma density and electron temperature are studied in a high power pulsed magnetron (HPPM) discharge at different Argon (Ar) gas pressures and different magnetron powers. It is reported that the EEDF during and shortly after the pulse can be represented by a bi-Maxwellian distribution indicating two energy groups of electrons. LÄS MER

  3. 3. Modeling High Power Impulse Magnetron Sputtering Discharges

    Detta är en avhandling från Stockholm : KTH Royal Institute of Technology

    Författare :Chunqing Huo; KTH.; [2012]
    Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY;

    Sammanfattning : HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot of attention ever since its appearance. A time-dependent plasma discharge model has been developed for the ionization region in HiPIMS discharges. LÄS MER

  4. 4. High power impulse magnetron sputtering under industrial conditions

    Detta är en avhandling från Linköping : Linköping University Electronic Press

    Författare :Mattias Samuelsson; Linköpings universitet.; Linköpings universitet.; [2011]
    Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; NATURAL SCIENCES; NATURVETENSKAP;

    Sammanfattning : In this thesis, the recent development step of magnetron sputtering, termed high power impulse magnetron sputtering (HiPIMS) has been studied. Compared to conventional magnetron sputtering HiPIMS provides a higher plasma density which can ionise the sputtered material. LÄS MER

  5. 5. Modeling and Experimental Studies of High Power Impulse Magnetron Sputtering Discharges

    Detta är en avhandling från Stockholm : KTH Royal Institute of Technology

    Författare :Chunqing Huo; KTH.; [2013]
    Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY;

    Sammanfattning : HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot of attention, ever since it was introduced in 1999. A time-dependent plasma discharge model has been developed for the ionization region (IRM) in HiPIMS discharges. LÄS MER