Sökning: "High Power Pulsed Magnetron Sputtering"
Visar resultat 6 - 10 av 15 avhandlingar innehållade orden High Power Pulsed Magnetron Sputtering.
6. Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering
Sammanfattning : The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). LÄS MER
7. The effect of extreme power densities applied to a planar magnetron
Sammanfattning : In plasma assisted thin film growth control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias. ions may be accelerated by an applied potential, whereas neutral particles may not. LÄS MER
8. Thin Film Growth using Pulsed and Highly Ionized Vapor Fluxes
Sammanfattning : Microstructure and morphology of thin films are decisive for many of their resulting properties. To be able to tailor these properties, and thus the film functionality, a fundamental understanding of thin film growth needs to be acquired. LÄS MER
9. Nucleation and stress generation in thin films deposited with a pulsed energetic deposition flux
Sammanfattning : This thesis presents fundamental mechanisms of nucleation and early growth of and stress generation in thin polycrystalline metal films deposited using pulsed energetic deposition fluxes. The effects of a pulsed deposition flux and energetic bombardment on film nucleation was investigated using in situ stress measurements and in situ ellipsometry to determine the film thickness at which the films become continuous. LÄS MER
10. Growth of Wide-Band Gap AlN and (SiC)x(AlN)1-x Thin Films by Reactive Magnetron Sputter Deposition
Sammanfattning : The research presented in this thesis is focused on thin film synthesis of epitaxial wurtzite structure aluminum nitride (AlN) and related alloy, (SiC)x(AlN)1-x,by ultra-high-vacuum (UHV) reactive magnetron sputter deposition, on silicon carbide (6H-SiC) substrates. The emphasis of the work is on controlling the growth and quality of the films to be able to use the materials in electronic device applications. LÄS MER