Sökning: "Highly ionized pulsed magnetron sputtering"

Hittade 5 avhandlingar innehållade orden Highly ionized pulsed magnetron sputtering.

1. 1. Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering

   Författare :Jones Alami; Ulf Helmersson; James Bradley; Linköpings universitet; []
   Nyckelord :Highly ionized pulsed magnetron sputtering; HPPMS; HPPIMS; thin film; plasma analysis; Langmuir probe; TECHNOLOGY; TEKNIKVETENSKAP;

   Sammanfattning : The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). LÄS MER

3. 2. Fundamentals of High Power Impulse Magnetron Sputtering

   Författare :Johan Böhlmark; Ulf Helmersson; André Anders; Linköpings universitet; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; Plasma; Pulsed plasma; High Power Pulsed Magnetron Sputtering; Plasma Characterization; Physics; Fysik;

   Sammanfattning : In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. LÄS MER

4. 3. Thin Film Growth using Pulsed and Highly Ionized Vapor Fluxes

   Författare :Viktor Elofsson; Kostas Sarakinos; Jones Alami; Linköpings universitet; []
   Nyckelord :;

   Sammanfattning : Microstructure and morphology of thin films are decisive for many of their resulting properties. To be able to tailor these properties, and thus the film functionality, a fundamental understanding of thin film growth needs to be acquired. LÄS MER

5. 4. The effect of extreme power densities applied to a planar magnetron

   Författare :Johan Böhlmark; Linköpings universitet; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES;

   Sammanfattning : In plasma assisted thin film growth control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias. ions may be accelerated by an applied potential, whereas neutral particles may not. LÄS MER

7. 5. Fundamental processes in thin film growth : The origin of compressive stress and the dynamics of the early growth stages

   Författare :Daniel Magnfält; Ulf Helmsersson; Eric Chason; Linköpings universitet; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES;

   Sammanfattning : The fundamental mechanisms behind the generation of compressive stresses in polycrystalline thin films, the effects of pulsed deposition fluxes on the dynamics of the early growth stages as well as the generation of energetic Ar+ ions in high power impulse magnetron sputtering (HiPIMS) discharges has been studied in this thesis.It was found that compressive film stresses in Mo films deposited using energetic vapor fluxes are correlated with high film densities while only a slight lattice expansion compared to relaxed Mo was found. LÄS MER