Sökning: "High power impulse magnetron sputtering HiPIMS"
Visar resultat 21 - 25 av 33 avhandlingar innehållade orden High power impulse magnetron sputtering HiPIMS.
21. Silicon Oxynitride Thin Films Grown by Reactive HiPIMS
Sammanfattning : Amorphous silicon oxynitride (SiOxNy) thin films were grown by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N2O plasmas. The elemental composition of the films was shown to depend on the target surface conditions during the film deposition, as well as on the reactive gas flow rate. LÄS MER
22. Magnetron Sputter Epitaxy of GaN Epilayers and Nanorods
Sammanfattning : In this research, electronic-grade GaN(0001) epilayers and nanorods have been grown onto Al2O3(0001) and Si(111) substrates, respectively, by reactive magnetron sputter epitaxy (MSE) using liquid Ga as a sputtering target. MSE, employing ultra high vacuum conditions, high-purity source materials, and lowenergy ion assisted deposition from substrate biasing, is a scalable method, lending itself to large area GaN synthesis. LÄS MER
23. Carbon based Thin Films Prepared by HiPIMS and DCMS
Sammanfattning : The present thesis focuses on carbon based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). The properties of such thin films can be tailored to an extensive variety; the film microstructure, for example, ranges in the presented work from fully amorphous, graphitic films to fullerene like (FL). LÄS MER
24. Carbon Nitride and Carbon Fluoride Thin Films Prepared by HiPIMS
Sammanfattning : The present thesis focuses on carbon based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). Carbon nitride (CNx: 0 < x < 0.20) as well as carbon fluoride (CFx: 0.16 < x < 0. LÄS MER
25. Plasma Enhanced Chemical- and Physical- Vapor Depositions Using Hollow Cathodes
Sammanfattning : Development of coating deposition technologies, in terms of performance and costs, is an ongoing process. A promising class of deposition technologies are based on hollow cathode discharges. LÄS MER