Sökning: "Beam size"
Visar resultat 1 - 5 av 255 avhandlingar innehållade orden Beam size.
1. Electron beam sizes and lifetimes at MAX II and MAX III
Sammanfattning : The MAX II and MAX III synchrotron light sources at MAX-lab provide synchrotron radiation for experiments in a wide variety of research fields. The synchrotron radiation is emitted by ultra-relativistic electrons circulating in electron storage rings. LÄS MER
2. Direct writing with an MeV proton beam: Development and Applications
Sammanfattning : This thesis presents work aimed at the development and application of a new lithography system for direct material patterning with the MeV proton beam at the Lund Nuclear Microprobe (NMP) facility. MeV proton beams are advantageous for use as a patterning tool due to their deep and well defined penetration through matter and their highly local energy deposition. LÄS MER
3. Beam-to-Beam Contact and Its Application to Micromechanical Simulation of Fiber Networks
Sammanfattning : This doctoral thesis covers the topic of modeling the three-dimensional fiber net- works with the finite element method. It contains the part addressing the numerical aspects of the modeling, namely, the contact formulation and application of the developed methods to the fundamental questions such as the effect of randomness in fiber properties and effect of fines and hygroexpansion. LÄS MER
4. Investigation of Melt Pool Thermo-hydrodynamic Behaviour inLaser Beam Welding ofTi-6Al-4V through Numerical Simulation
Sammanfattning : Laser is an efficient and widely used heat source in metal processing suchas welding and additive manufacturing. It has some great advantages compared to the other conventional heat sources like electron beam and arc namely: ability of handling complicated joint geometries and producing large components. LÄS MER
5. Ion beam etching of InP based materials
Sammanfattning : Dry etching is an important technique for pattern transferin fabrication of most opto-electronic devices, since it canprovide good control of both structure size and shape even on asub-micron scale. Unfortunately, this process step may causedamage to the material which is detrimental to deviceperformance. LÄS MER