Sökning: "chemical mechanical planarization"
Hittade 3 avhandlingar innehållade orden chemical mechanical planarization.
1. Chemical Mechanical Polishing of Silicon and Silicon Dioxide in Front End Processing
Sammanfattning : Chemical mechanical polishing (CMP) has been used for a long time in the manufacturing of prime silicon wafers for the IC industry. Lately, other substrates, such as silicon-on-insulator has become in use which requires a greater control of the silicon CMP process. LÄS MER
2. Waste Heat Driven Membrane Distillation for Industrial Wastewater Treatment
Sammanfattning : The European Union has placed a high priority on reaching the goals described in the 2030 Agenda for Sustainable Development. This aim has provided added momentum to member-state environmental regulatory authorities to further tighten the discharge limits of industrial wastewater. LÄS MER
3. Fabrication of Group IV Semiconductors on Insulator for Monolithic 3D Integration
Sammanfattning : The conventional 2D geometrical scaling of transistors is now facing many challenges in order to continue the performance enhancement while decreasing power consumption. The decrease in the device power consumption is related to the scaling of the power supply voltage (Vdd) and interconnects wiring length. LÄS MER