Sökning: "microwave scanning"
Visar resultat 16 - 20 av 23 avhandlingar innehållade orden microwave scanning.
16. Design, Fabrication, and Characterization of Nano-Photonic Components Based on Silicon and Plasmonic Material
Sammanfattning : Size reduction is a key issue in the development of contemporary integrated photonics. This thesis is mainly devoted to study some integrated photonic components in sub-wavelength or nanometric scales, both theoretically and experimentally. LÄS MER
17. Location-aided Beam Alignment and Handover in Millimeter-wave Networks
Sammanfattning : Ever-increasing data rate demands in mobile networks and the spectrum scarcity at the microwave bands have resulted in the exploration of millimeter-wave (mmWave) frequencies for the next generation of wireless networks. While mmWave frequencies offer large bandwidth, communication at these frequencies is not straightforward due to the challenging propagation characteristics. LÄS MER
18. Submillimeter-Wave Waveguide Frontends by Silicon-on-Insulator Micromachining
Sammanfattning : This thesis presents novel radiofrequency (RF) frontend components in the submillimeter-wave (sub-mmW) range implemented by silicon micromachining, or deep reactive ion etching (DRIE). DRIE is rapidly becoming a driving technology for the fabrication of waveguide components and systems when approaching the terahertz (THz) frequency range. LÄS MER
19. A Biotechnology Perspective on Silicon Nanowire FETs for Biosensor Applications
Sammanfattning : The study of silicon nanowire-FET-based electronic biosensor applications is an emerging scientific field. These biosensors have the benefit of being theoretically extremely sensitive and reports of down to femtomolar (fM) levels of biomolecule detection have been reported. LÄS MER
20. Chemical vapour deposition of sp2-hybridised B-C-N materials from organoborons
Sammanfattning : Thin films of sp2-BN are promising materials for graphene and deep-UV optoelectronics. They are typically deposited by thermally activated chemical vapour deposition (CVD) from triethylboron (TEB) and ammonia (NH3) at 1500 °C, albeit in a narrow process window. LÄS MER