Sökning: "riktad självorganisation"

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  1. 1. Block Copolymer Nanolithography for Sub-50 nm Structure Applications

    Författare :Anette Löfstrand; NanoLund: Centre for Nanoscience; []
    Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; NATURVETENSKAP; NATURAL SCIENCES; Sampolymer; riktad självorganisation; ytrekonstruktion; mönsteröverföring; sekventiell infiltrationssyntes; neutronreflektometri; Block copolymer; Directed self-assembly; Surface reconstruction; Pattern transfer; Sequential infiltration synthesis; Neutron reflectometry; Fysicumarkivet A:2021:Löfstrand;

    Sammanfattning : As high technology device patterns are continuing to move towards decreasing critical dimensions and increasing pattern density, there is a need for lithography to move in the same direction. Block copolymer (BCP) lithography is a promising technique, which has single digit nanometer resolution, has a pattern periodicity of about 7-200 nm, and easily scales up to large area at a low cost. LÄS MER