Sökning: "pulsed discharge"
Visar resultat 1 - 5 av 17 avhandlingar innehållade orden pulsed discharge.
1. Numerical modeling of pulsed volume discharges for the generation of ozone
Sammanfattning : The pulsed electric volume discharge is a new alternativefor the efficient generation of ozone in compact systems. Thisthesis presents a parameter study of the reactions in this kindof homogeneous discharge, using a here developed numericalmodel DISCHEM which solves plasma chemical kinetic rate andenergy equations. LÄS MER
2. Fundamentals of High Power Impulse Magnetron Sputtering
Sammanfattning : In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. LÄS MER
3. Plasma characterisation in high power pulsed magnetron sputtering
Sammanfattning : In this thesis, plasma parameters including plasma and floating potentials, electron energy distribution function (EEDF) plasma density and electron temperature are studied in a high power pulsed magnetron (HPPM) discharge at different Argon (Ar) gas pressures and different magnetron powers. It is reported that the EEDF during and shortly after the pulse can be represented by a bi-Maxwellian distribution indicating two energy groups of electrons. LÄS MER
4. Modelling and Applications of the Hollow Cathode Plasma
Sammanfattning : This thesis presents experimental and modelling research on atmospheric pressure hollow cathodes and hollow electrodes. Experiments with the hybrid hollow electrode activated discharge (H-HEAD), which is a combination of a hollow cathode and a microwave plasma source, is presented. LÄS MER
5. Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering
Sammanfattning : The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). LÄS MER