Sökning: "pattern transfer lithography"
Visar resultat 1 - 5 av 8 avhandlingar innehållade orden pattern transfer lithography.
Sammanfattning : Silicon nanowires (SiNW) are in the spotlight for a few years in the research community as a good candidate for biosensing applications. This is attributed to their small dimensions in nanometer scale that offers high sensitivity, label-free detection and at the same time utilizing small amount of sample. LÄS MER
Sammanfattning : Today, the dominating way of patterning nanosystems is by irradiation-based lithography (e-beam, DUV, EUV, and ions). Compared to the other irradiations, ion tracks created by swift heavy ions in matter give the highest contrast, and its inelastic scattering facilitate minute widening and high aspect ratios (up to several thousands). LÄS MER
Sammanfattning : The thesis presents studies on the processing technology and the characterization of nanometer-sized and low-dimensional structures in III-V semiconductors. Two major approaches are described: 1) the combination of aerosol technology and plasma etching for the fabrication of quantum dots (QDs) in InP-based materials and 2) the use of high-resolution electron beam lithography and plasma or wet chemical etching to make quantum well wires (QWWs) in both GaAs and InP-based structures. LÄS MER
Sammanfattning : This thesis presents studies concerning the development of nanoimprint lithography technology, nanoimprint lithography-based nanofabrication, as well as the production of NEMS devices and their characterization. It can be divided into the following parts: The first part introduces different NIL stamp fabricating methods and processes. LÄS MER
Sammanfattning : As high technology device functionalities seem to constantly be moving towards decreasing critical dimensions and increasing density, there is a need for lithography research to move in the same direction. Block copolymer (BCP) lithography is a promising technique, which has single-digit nanometer resolution, typically has a pattern periodicity of 10-50 nm, and easily scales up the patterned area at a low cost. LÄS MER