Sökning: "neutronreflektometri"
Hittade 1 avhandling innehållade ordet neutronreflektometri.
1. Block Copolymer Nanolithography for Sub-50 nm Structure Applications
Sammanfattning : As high technology device patterns are continuing to move towards decreasing critical dimensions and increasing pattern density, there is a need for lithography to move in the same direction. Block copolymer (BCP) lithography is a promising technique, which has single digit nanometer resolution, has a pattern periodicity of about 7-200 nm, and easily scales up to large area at a low cost. LÄS MER
Resultatsidor:
1