Sökning: "magnetron sputtering"
Visar resultat 21 - 25 av 192 avhandlingar innehållade orden magnetron sputtering.
21. Designing multicomponent alloy coatings for corrosion protection
Sammanfattning : This thesis explores the design of metallic coatings for corrosion protection. The subject of the study was the new class of materials multicomponent alloys (MCAs, also known as high entropy alloys). They consist of near-equal concentrations of many (four or more) metals and are often reported to form a single phase with a simple crystal structure. LÄS MER
22. Cantor-Alloy-Based Multicomponent Nitride Thin Films
Sammanfattning : In this Thesis, I have investigated multicomponent alloy based thin films synthesized by magnetron sputtering. The studies in the thesis are centered around the phase diagram of the CrFeCoNi nitrogen containing system. LÄS MER
23. Refractory High-entropy Alloy and Nitride Thin Films
Sammanfattning : This thesis focuses on understanding the process-structure-property relation-ships for several refractory-metal-based high-entropy alloys and nitrides synthesized by magnetron sputtering. The thesis begins with the growth of TiZrNbTaNx understoichiometric nitrides by controlling substrate temperature and nitrogen flow ratio fN. LÄS MER
24. Corrosion and Surface Studies of Stainless Steel and Chromium Carbide Thin-Films
Sammanfattning : Although the passive films that form on stainless steels have been extensively studied, the concentration depth profiles are not fully understood. Their thinness makes passive films hard to study, but angle-resolved X-ray photoelectron spectroscopy (ARXPS) is a non-destructive technique that can be used to obtain depth information. LÄS MER
25. Electrochromic Nickel – Tungsten Oxides : Optical, Electrochemical and Structural Characterization of Sputter-deposited Thin Films in the Whole Composition Range
Sammanfattning : This thesis investigates the electrochromic NixW1-x oxide thin film system, where 0 < x < 1. The thin films were deposited by reactive DC magnetron co-sputtering from one Ni and one W metal target. In addition, Ni oxide was deposited with water vapor added to the sputtering gas. LÄS MER