Sökning: "magnetron sputtering"
Visar resultat 11 - 15 av 192 avhandlingar innehållade orden magnetron sputtering.
11. High power impulse magnetron sputtering under industrial conditions
Sammanfattning : In this thesis, the recent development step of magnetron sputtering, termed high power impulse magnetron sputtering (HiPIMS) has been studied. Compared to conventional magnetron sputtering HiPIMS provides a higher plasma density which can ionise the sputtered material. LÄS MER
12. Plasma characterisation in high power pulsed magnetron sputtering
Sammanfattning : In this thesis, plasma parameters including plasma and floating potentials, electron energy distribution function (EEDF) plasma density and electron temperature are studied in a high power pulsed magnetron (HPPM) discharge at different Argon (Ar) gas pressures and different magnetron powers. It is reported that the EEDF during and shortly after the pulse can be represented by a bi-Maxwellian distribution indicating two energy groups of electrons. LÄS MER
13. Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering
Sammanfattning : The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). LÄS MER
14. Plasma properties in high power impulse magnetron sputtering
Sammanfattning : The work presented in this thesis involves experimental and theoretical studies related to plasma properties in high power impulse magnetron sputtering (HiPIMS), and more specifically plasma transport. HiPIMS is an ionized PVD method based on conventional direct current magnetron sputtering (dcMS). LÄS MER
15. Multicomponent Nitride Thin Films by Reactive Magnetron Sputtering
Sammanfattning : .... LÄS MER