Sökning: "low temperature MBE"
Visar resultat 1 - 5 av 15 avhandlingar innehållade orden low temperature MBE.
1. Photoelectron Spectroscopy Studies of III-V Semiconductor Systems
Sammanfattning : Photoelectron spectroscopy has been used as a main tool to study a number of III-V semiconductor surfaces. This thesis includes studies of a surface reaction, As/InP(110), thin heteroepitaxial layers, InAs on GaAs(111)A and GaAs on AlAs(100), and a diluted magnetic semiconductor, Ga1-xMnxAs. LÄS MER
2. Threshold and Temperature Characteristics of InGa(N)As-GaAs Multiple Quantum Well Lasers
Sammanfattning : Semiconductor lasers emitting in the 1.3 μm regime are of interest for applications in access-networks like fiber-to-the-home and radio-over-fiber systems. Suchfiber optical networks are expected to replace the copper-based access-networks currently in use due to a continuously increasing demand on user bandwidth. LÄS MER
3. Silicon δ-doping and Isoelectronic Doping in GaAs ans GaN Layers Grown by MBE
Sammanfattning : This work concerns MBE-grown material, particularly physical effects due to controlled impurities of Si and N in arsenides, and the growth of nitrides and studies of Al- and As-impurities in them. Apart from interesting physical phenomena there are important device applications. The first part is devoted to studies of Si .delta. LÄS MER
4. Dilute Nitride Lasers and Spectrally Engineered Semiconductor Laser Resonators
Sammanfattning : The first part of this thesis deals with long wavelength (1.2-1.3 um) InGaAs(N)multiple quantum-well (QW) lasers grown on GaAs, with the aim of understandingand improving their threshold and temperature characteristics. The epitaxialmaterial is grown by molecular beam epitaxy (MBE). LÄS MER
5. Growth of ZnO/GaN distributed Bragg reflectors by plasma-assisted molecular beam epitaxy
Sammanfattning : This thesis describes epitaxial growth of ZnO/GaN distributed Bragg reflectors by hybrid plasma-assisted molecular beam epitaxy on GaN(0001). The unique hybrid approach employed the same growth chamber for continuous growth of both ZnO and GaN without exposing the layers to the ambient conditions. LÄS MER