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Visar resultat 1 - 5 av 18 avhandlingar som matchar ovanstående sökkriterier.
1. Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering
Sammanfattning : The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). LÄS MER
2. Plasma Enhanced Chemical- and Physical- Vapor Depositions Using Hollow Cathodes
Sammanfattning : Development of coating deposition technologies, in terms of performance and costs, is an ongoing process. A promising class of deposition technologies are based on hollow cathode discharges. LÄS MER
3. Fundamentals of High Power Impulse Magnetron Sputtering
Sammanfattning : In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. LÄS MER
4. Modeling High Power Impulse Magnetron Sputtering Discharges
Sammanfattning : HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot of attention ever since its appearance. A time-dependent plasma discharge model has been developed for the ionization region in HiPIMS discharges. LÄS MER
5. Plasma properties in high power impulse magnetron sputtering
Sammanfattning : The work presented in this thesis involves experimental and theoretical studies related to plasma properties in high power impulse magnetron sputtering (HiPIMS), and more specifically plasma transport. HiPIMS is an ionized PVD method based on conventional direct current magnetron sputtering (dcMS). LÄS MER