Sökning: "ion beam lithography"
Visar resultat 1 - 5 av 32 avhandlingar innehållade orden ion beam lithography.
1. Direct writing with an MeV proton beam: Development and Applications
Sammanfattning : This thesis presents work aimed at the development and application of a new lithography system for direct material patterning with the MeV proton beam at the Lund Nuclear Microprobe (NMP) facility. MeV proton beams are advantageous for use as a patterning tool due to their deep and well defined penetration through matter and their highly local energy deposition. LÄS MER
2. Low and High Energy Ion Beams in Nanotechnology
Sammanfattning : In this thesis, two ways of fabrication of nanometer-sized semiconductor features are presented. Low Energy Ion Implantation (LEII) has been used to create shallow (sub-50 nm) and laterally small (5 m m – 200 nm) features by 10 keV As+ doping of B background doped Si. LÄS MER
3. Bioelectronic Nanosensor Devices for Environmental and Biomedical Analysis
Sammanfattning : A new type of Bioelectronic Nanosensor Device with potential applications in medicine,biotechnology and environmental analysis was designed. The nanosensor is based on RISFET (Regional Ion Sensitive Field Effect Transistor) technology. LÄS MER
4. Fabrication and Applications of a Focused Ion Beam Based Nanocontact Platform for Electrical Characterization of Molecules and Particles
Sammanfattning : The development of new materials with novel properties plays an important role in improving our lives and welfare. Research in Nanotechnology can provide e.g. cheaper and smarter materials in applications such as energy storage and sensors. LÄS MER
5. Ion Tracks for Micro- and Nanofabrication : From Single Channels to Superhydrophobic Surfaces
Sammanfattning : A method is described for preset-count irradiations between 1 and 100 ions singling-out individual ions from an ion beam with more than a billion ions arriving per second. The ion tracks are etched in a conductometric system with real-time evaluation of the acquired data. The etch process can be interrupted when reaching a preset channel diameter. LÄS MER