Sökning: "film thickness measurement"
Visar resultat 6 - 10 av 26 avhandlingar innehållade orden film thickness measurement.
6. Advanced MEMS Pressure Sensors Operating in Fluids
Sammanfattning : Today’s MEMS technology allows manufacturing of miniaturized, low power sensors that sometimes exceeds the performance of conventional sensors. The pressure sensor market today is dominated by MEMS pressure sensors.In this thesis two different pressure sensor techniques are studied. LÄS MER
7. Multimethod aerodynamic research of engine-realistic turbine rear structures
Sammanfattning : Despite the significant advancements in aircraft engine technology over the past years, the aerodynamics of engine-realistic turbine rear structures (TRS) remain largely unexplored. The TRS, a structural and aerodynamic component situated downstream of the low-pressure turbine (LPT), plays a pivotal role in engine aerodynamic performance, deswirling the LPT flow to maximize the engine thrust. LÄS MER
8. VO2-based Thermochromic and Nanothermochromic Materials for Energy-Efficient Windows : Computational and Experimental Studies
Sammanfattning : VO2-based films are thermochromic and exhibit high or low infrared transmittance when the temperature is below or above a critical temperature. The thermochromic switching is passive and reversible, and therefore VO2 based films are promising for energy-efficient window applications. LÄS MER
9. Epitaxial aluminum nitride thin films on 6H-silicon carbide, grown by magnetron sputter deposition
Sammanfattning : The research presented in this thesis is focused on epitaxial wurtzite-structure Aluminum Nitride (AlN) thin film synthesis, by ultra-high-vacuum (UHV) de magnetron sputter deposition, on Silicon Carbide (6H-SiC) substrates. The emphasis of the work has been put on controlling the growth and quality of the films to be able to use this material in electronic device applications. LÄS MER
10. Investigation of surface and interface phenomena in silicon and silicon dioxide systems
Sammanfattning : The characterization of a thin silicon dioxide (SiO2) film close to the silicon dioxide -silicon interface is very important in understanding and improving solid state electronic and optoelectronic devices. The refractive index, the dielectric constant, and the density of oxide film, are all related to the chemical composition and porosity (voids) of the films. LÄS MER