Sökning: "deposition conditions"
Visar resultat 1 - 5 av 437 avhandlingar innehållade orden deposition conditions.
1. Epiphytic lichen responses to nitrogen deposition
Sammanfattning : Nitrogen (N) deposition has increased globally over the last 150 years and further increase is predicted for the future. Nitrogen is an important nutrient for lichens, involved in many processes in both photobiont and mycobiont. However, N can be a stressor, causing many lichens and lichen communities to disappear with increased deposition. LÄS MER
2. Laser-Directed Energy Deposition : Influence of Process Parameters and Heat-Treatments
Sammanfattning : Laser-Directed Energy Deposition (L-DED), an Additive Manufacturing (AM) processused for the fabrication of parts in a layer-wise approach has displayed an immense potential over the last decade. The aerospace industry stands as the primary beneficiary due to the L-DED process capability to build near-net-shape components with minimal tooling and thereby producing minimum wastage because of reduced machining. LÄS MER
3. A Study of Group 13-Nitride Atomic Layer Deposition : Computational Chemistry Modelling of Atomistic Deposition Processes
Sammanfattning : The crystalline solids aluminium nitride (AlN), gallium nitride (GaN) and indium nitride (InN), together with their alloys, are of huge interest in the semiconductor industry. Their bandgaps span an extensive range from 6.0 eV for AlN to 0.7 eV for InN, with GaN in between at a bandgap of 3. LÄS MER
4. An Insight into the Critical Role of Microstructure and Surface Preparation on Localized Conversion Coating Deposition on Cast Al Alloys
Sammanfattning : The spontaneous cerium conversion coating formation over aluminium alloys is affected by the chemical process conditions, the surface preparation prior to conversion treatment and the microstructure of the underlying alloy. Most research performed until now focus only on the former whereas the influence of the latter two is poorly understood. LÄS MER
5. Vapor phase deposition of WO and WC
Sammanfattning : WO3 and WC are two compounds that are widely used for a number of different thin film applications. In this thesis, these compounds have been deposited using two different deposition methods: atomic layer epitaxy (ALE) and chemical vapor deposition (CVD). LÄS MER