Sökning: "chemical vapour deposition CVD"

Visar resultat 1 - 5 av 35 avhandlingar innehållade orden chemical vapour deposition CVD.

1. 1. Chemical Vapour Deposition of Undoped and Oxygen Doped Copper (I) Nitride

   Författare :Anna Fallberg; Jan-Otto Carlsson; Mikael Ottosson; Kwang-Leong Choy; Uppsala universitet; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; Chemical vapour deposition; copper hexafluoroacetylacetonate; copper I nitride; copper I oxide; multilayers; oxygen doping; Organic chemistry; Organisk kemi; Inorganic Chemistry; oorganisk kemi;

   Sammanfattning : In science and technology there is a steadily increased demand of new materials and new materials production processes since they create new application areas as well as improved production technology and economy. This thesis includes development and studies of a chemical vapour deposition (CVD) process for growth of thin films of the metastable material copper nitride, Cu3N, which is a semiconductor and decomposes at around 300 oC. LÄS MER

3. 2. CVD and ALD of Group IV- and V-Oxides for Dielectric Applications

   Författare :Katarina Forsgren; Steven George; Uppsala universitet; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; Chemistry; CVD; ALD; Dielectric constant; Tantalum oxide; Ta2O5; Zirconium oxide; ZrO2; Hafnium oxide; HfO2; QCM; Kemi; Chemistry; Kemi; Inorganic Chemistry; oorganisk kemi;

   Sammanfattning : Due to the constantly decreasing dimensions of electronic devices, the conventional dielectric material in transistors and capacitors, SiO2, has to be replaced by a material with higher dielectric constant. Some of the most promising candidates are tantalum oxide,Ta2O5, zirconium oxide, ZrO2 and hafnium oxide, HfO2. LÄS MER

4. 3. Chemical vapour deposition of boron-carbon thin films from organoboron precursors

   Författare :Maiwulidan (Mewlude) Yimamu (Imam); Henrik Pedersen; Jens Birch; Carina Höglund; Erik Lindahl; Linköpings universitet; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; NATURVETENSKAP; NATURAL SCIENCES;

   Sammanfattning : Boron-carbon (BxC) thin films enriched in 10B are potential neutron converting layers for 10Bbased solid-state neutron detectors given the good neutron absorption cross-section of 10B atoms in the thin film. Chemical Vapour Deposition (CVD) of such films faces the challenge that the maximum temperature tolerated by the aluminium substrate is 660 °C and low temperature CVD routes for BxC films are thus needed. LÄS MER

5. 4. CVD on Iron Powder - Using Fluidising Bed Techniques

   Författare :Lars Nilsson; Industriell Produktion; []
   Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; aluminium oxide; alumina; chemical vapour deposition; eddy current losses; FBR; iron; fluidising bed reactor; powder; SiO2; SMC; TiO2; Al2O3; soft ma etic com sites; CVD;

   Sammanfattning : Today's electrical energy conversion devices, such as motors, transformers, inductors and generators, are based on laminated magnetic cores for reduction of eddy current losses, imposing a two-dimensional magnetic flux distribution. Using a three-dimensional magnetic flux distribution while maintaining low magnetic losses requires new approaches to magnetic core materials. LÄS MER

7. 5. CVD and ALD in the Bi-Ti-O system

   Författare :Mikael Schuisky; Uppsala universitet; []
   Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; Chemistry; Halide-CVD; ALD; Bismuth titanate; Bi4Ti3O12; Titanium oxide; TiO2; Bismuthoxide; Bi2O2.33; Epitaxy; QCM.; Kemi; Chemistry; Kemi; Inorganic Chemistry; oorganisk kemi;

   Sammanfattning : Bismuth titanate Bi4Ti3O12, is one of the bismuth based layered ferroelectric materials that is a candidate for replacing the lead based ferroelectric materials in for instance non-volatile ferroelectric random access memories (FRAM). This is due to the fact that the bismuth based ferroelectrics consists of pseudo perovskite units sandwiched in between bismuth oxide layers, which gives them a better fatigue nature. LÄS MER