Sökning: "Zirconium diboride ZrB2"

Hittade 3 avhandlingar innehållade orden Zirconium diboride ZrB2.

  1. 1. Growth and Characterization of ZrB2 Thin Films

    Författare :Lina Tengdelius; Hans Högberg; Urban Forsberg; Denis Music; Linköpings universitet; []
    Nyckelord :Zirconium diboride ZrB2 ; Thin film; Magnetron sputtering; Epitaxi; Silicon carbide SiC ;

    Sammanfattning : In this thesis, growth of ZrB2 thin films by direct current magnetron sputtering is investigatedusing a high vacuum industrial scale deposition system and an ultra-high vacuum laboratory scalesystem. The films were grown from ZrB2 compound targets at temperatures ranging from ambient (without external heating) to 900 °C and with substrate biases from -20 to -120 V. LÄS MER

  3. 2. ZrB2 Thin Films : Growth and Characterization

    Författare :Lina Tengdelius; Hans Högberg; Urban Forsberg; Gregory S. Girolami; Linköpings universitet; []
    Nyckelord :NATURVETENSKAP; NATURAL SCIENCES;

    Sammanfattning : Zirconium diboride, ZrB2, is a ceramic material with bulk properties such as high melting point (3245 °C), high hardness (23 GPa), and low resistivity (~8 μΩcm). Thin film growth of ZrB2 using physical vapor deposition has suffered from problems with films deviating from stoichiometry and with high levels of contaminants, especially high oxygen content. LÄS MER

  4. 3. Chemical vapour deposition of sp2-hybridised B-C-N materials from organoborons

    Författare :Laurent Souqui; Anne Henry; Hans Högberg; Henrik Pedersen; John R. Abelson; Linköpings universitet; []
    Nyckelord :TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; boron nitride; epitaxy; CVD; boron carbide; carbonitride; PECVD;

    Sammanfattning : Thin films of sp2-BN are promising materials for graphene and deep-UV optoelectronics. They are typically deposited by thermally activated chemical vapour deposition (CVD) from triethylboron (TEB) and ammonia (NH3) at 1500 °C, albeit in a narrow process window. LÄS MER