Avancerad sökning
Visar resultat 1 - 5 av 8 avhandlingar som matchar ovanstående sökkriterier.
1. Atomic Layer Deposition of Copper, Copper(I) Oxide and Copper(I) Nitride on Oxide Substrates
Sammanfattning : Thin films play an important role in science and technology today. By combining different materials, properties for specific applications can be optimised. LÄS MER
2. Conformal chemical vapor deposition of boron carbide thin films
Sammanfattning : The sustainability goals of the modern world and the fascinating properties of sub-micron scale materials promote development of materials in thin film form. Thin films are materials that have thicknesses ranging from sub-nanometer to several micrometers, synthesized by various deposition techniques. LÄS MER
3. Muspel and Surtr : CVD system and control program for WF6 chemistry
Sammanfattning : CVD (Chemical Vapour Deposition) is an advanced technique for depositing a coating on a substrate. CVD implies that a solid phase is deposited on a normally heated substrate surface using a reactive, gaseous mixture. The reaction gas mixture must be carefully chosen to prevent homogeneous nucleation in the gas phase. LÄS MER
4. Cadmium Free Buffer Layers and the Influence of their Material Properties on the Performance of Cu(In,Ga)Se2 Solar Cells
Sammanfattning : CdS is conventionally used as a buffer layer in Cu(In,Ga)Se2, CIGS, solar cells. The aim of this thesis is to substitute CdS with cadmium-free, more transparent and environmentally benign alternative buffer layers and to analyze how the material properties of alternative layers affect the solar cell performance. LÄS MER
5. Window Layer Structures for Chalcopyrite Thin-Film Solar Cells
Sammanfattning : This thesis aims to contribute to the development of improved window layer structures for chalcopyrite thin-film solar cells, with an emphasis on the buffer layer, to assist future reductions of the levelized cost of energy. This is realized by exploring the potential of existing materials and deposition processes, as well as developing new buffer layer processes based on atomic layer deposition (ALD). LÄS MER