Sökning: "Plasma enhanced chemical vapor deposition"
Visar resultat 1 - 5 av 12 avhandlingar innehållade orden Plasma enhanced chemical vapor deposition.
Sammanfattning : Cubic boron nitride (c-BN) has been in focus for several years due to its interesting properties. The possibility for large area chemical vapor deposition (CVD) is a requirement for the realization of these different properties in various applications. Unfortunately, there are at present severe problems in the CVD growth of c-BN. LÄS MER
Sammanfattning : Development of coating deposition technologies, in terms of performance and costs, is an ongoing process. A promising class of deposition technologies are based on hollow cathode discharges. LÄS MER
Sammanfattning : This thesis deals with growth, characterization and application of carbon nanotubes. The methods involved in the production of carbon nanotubes are thermal chemical vapor deposition (T-CVD) and plasma enhanced chemical vapor deposition (PE-CVD). LÄS MER
Sammanfattning : The synthesis of vertically aligned carbon nanofibers (VACNFs) by direct current plasma enhanced chemical vapor deposition (dc PECVD) has presented a unique opportunity to realize nanoscale three-dimensional devices at a reasonable cost. The determinism offered by the synthesis process in terms of control over the spatial and the geometrical properties of the resulting nanofibers provides a powerful tool to implement a wide range of applications from nanoelectromechanical systems to biological devices. LÄS MER
5. Silicon dioxide and aluminium nitride as gate dielectric for high temperature and high power silicon carbide MOSFETs
Sammanfattning : Silicon carbide (SIC) is a wide bandgap semiconductor thathas been suggested as a replacement for silicon in applicationsusing high voltages, high frequencies, high temperatures orcombinations thereof. Several basic process steps need to bedeveloped for reliable manufacturing of long-term stableelectronic devices. LÄS MER