Sökning: "III-V"
Visar resultat 21 - 25 av 304 avhandlingar innehållade ordet III-V.
21. Surface modification of III-V nanostructures studied by low-temperature scanning tunneling microscopy
Sammanfattning : In the past decade, driven by the demand for materials with high performance for next-generation semiconductor devices (e.g. LÄS MER
22. Fabrication of Low-Dimensional Structures in III-V Semiconductors
Sammanfattning : The thesis presents studies on the processing technology and the characterization of nanometer-sized and low-dimensional structures in III-V semiconductors. Two major approaches are described: 1) the combination of aerosol technology and plasma etching for the fabrication of quantum dots (QDs) in InP-based materials and 2) the use of high-resolution electron beam lithography and plasma or wet chemical etching to make quantum well wires (QWWs) in both GaAs and InP-based structures. LÄS MER
23. Zeeman Interaction in Low-Dimensional III-V Semiconductor Structures
Sammanfattning : The Zeeman interaction in low-dimensional III-V semiconductor nanostructures is studied. The effective g-value of bulk InGaAs is measured by two different spin resonance techniques. Experimental conditions were found to control the Overhauser effect, thus enabling a highly accurate determination of the g-value, g* = -4.070 ± 0. LÄS MER
24. In-situ Study of the Growth, Composition and Morphology of III-V Semiconductor Nanowires
Sammanfattning : It is widely known that nanoparticle seeded growth of III-V semiconductor nanowires often occurs via the vapor-liquid-solid mechanism. However, conventional growth of nanowires is carried out in closed systems, where mostof the details and dynamics of the growth are impossible to follow. LÄS MER
25. Surfaces and interfaces of low dimensional III-V semiconductor devices
Sammanfattning : The demand for fast and energy efficient (opto-)electronic applications needs high mobility semiconductor materials, such as InAs with a very high electron mobility and GaSb with a very high hole mobility. Beyond the material itself, also an innovative device geometry is needed, for example, the gate-all-around geometry that provides higher efficiency and electrostatic control for computational units. LÄS MER