Sökning: "Hans Högberg"
Visar resultat 11 - 15 av 30 avhandlingar innehållade orden Hans Högberg.
11. Functional Nanostructures for Gas Sensors
Sammanfattning : This research focuses on three main topics within the aims of FUNMAT, which are:Ohmic contacts to high-temperature chemical gas sensors.Studies of catalytic monolayers on active gate metal in SiC-based gas sensors.Investigating potential sensing properties of the nanoscale material MXene. LÄS MER
12. Deracemization of Functionalized Alcohols via Combined Ruthenium and Enzyme Catalysis
Sammanfattning : The major part of this thesis describes the synthesis of enantiopure alcohols and diols by combining ruthenium-catalyzed racemization or epimerization and lipase-catalyzed asymmetric transformations. A minor part of this thesis is focused on ruthenium-catalyzed redox reactions for transfer hydrogenation of 1,3-cycloalkanediketones. LÄS MER
13. Thick and Thin Ti2AlC Coatings
Sammanfattning : This Thesis explores the deposition techniques of magnetron sputtering and high velocity oxy-fuel (HVOF) spraying for Ti2AlC as a promising high-temperature material. Magnetron sputtering aims at producing thin (≤1 μm) Ti2AlC films of high crystal quality for use as a model system in understanding the material’s basic properties. LÄS MER
14. Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering
Sammanfattning : Silicon nitride and silicon nitride-based ceramics have several favorable material properties, such as high hardness and good wear resistance, which makes them important materials for the coating industry. This thesis focuses the synthesis of silicon nitride, silicon oxynitride, and silicon carbonitride thin films by reactive magnetron sputtering. LÄS MER
15. Silicon Oxynitride Thin Films Grown by Reactive HiPIMS
Sammanfattning : Amorphous silicon oxynitride (SiOxNy) thin films were grown by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N2O plasmas. The elemental composition of the films was shown to depend on the target surface conditions during the film deposition, as well as on the reactive gas flow rate. LÄS MER