Sökning: "EUV"

Visar resultat 1 - 5 av 16 avhandlingar innehållade ordet EUV.

  1. 1. The sick buidling syndrome

    Författare :Tyrrell S. Burt; KTH; []
    Nyckelord :;

    Sammanfattning : This investigation consisted of an intervention study of asingle officebuilding. In the first study, already reported, itwas concluded thatmicrobiological and chemical factors wereunlikely to be responsible forsymptoms of sick buildingsyndrome (SBS) in this building. The focus of theinvestigationtherefore narrowed down to the physical factors. LÄS MER

  3. 2. Ventilation and stable climate

    Författare :Gery Einberg; KTH; []
    Nyckelord :Stable; Olfaction; Natural ventilation; Steven s law; Animal wellbeing; Optimum climate; Ammonia; Modeling; Humidity; Wind;

    Sammanfattning : .... LÄS MER

  4. 3. Compact Liquid-Jet X-Ray Sources

    Författare :Oscar Hemberg; KTH; []
    Nyckelord :liquid-jet; x-ray; EUV; plasma; electron beam; source;

    Sammanfattning : This thesis describes the development, characterization andoptimization of compact, high-brightness, liquid-jet-targetx-ray sources. Two different source types have been developedfor different wavelength regions and applications. LÄS MER

  5. 4. DEVELOPMENT OF A HIGH ENERGY TI:SAPPHIRE LASER FOR THE EXCITATION OF EXTREME ULTRAVIOLET LASERS

    Författare :Dale Martz; Jorge Rocca; Colorado State University; []
    Nyckelord :NATURVETENSKAP; NATURAL SCIENCES; SRA - E-vetenskap SeRC ; SRA - E-Science SeRC ;

    Sammanfattning : This dissertation describes the design, construction and characterization of a high energy chirped-pulse amplification Titanium-Sapphire laser system for the excitation of Extreme Ultraviolet (EUV) lasers. Compact EUV lasers have made possible nano-scale imaging, dense plasma diagnostics and photo-chemistry and photo-physics studies. LÄS MER

  7. 5. Laser-Plasma Sources for Extreme-Ultraviolet Lithography

    Författare :Björn Hansson; KTH; []
    Nyckelord :fluid and plasma; radiation; electronics; electrical;

    Sammanfattning : This thesis describes the development and characterizationof a liquidxenon- jet laser-plasma source forextreme-ultraviolet (EUV) radiation. It is shown how thissource may be suitable for production-scale EUV lithography(EUVL). LÄS MER