Sökning: "Cu hfac 2"
Hittade 2 avhandlingar innehållade orden Cu hfac 2.
1. Atomic Layer Deposition of Copper, Copper(I) Oxide and Copper(I) Nitride on Oxide Substrates
Sammanfattning : Thin films play an important role in science and technology today. By combining different materials, properties for specific applications can be optimised. LÄS MER
2. Chemical Vapour Deposition of Undoped and Oxygen Doped Copper (I) Nitride
Sammanfattning : In science and technology there is a steadily increased demand of new materials and new materials production processes since they create new application areas as well as improved production technology and economy. This thesis includes development and studies of a chemical vapour deposition (CVD) process for growth of thin films of the metastable material copper nitride, Cu3N, which is a semiconductor and decomposes at around 300 oC. LÄS MER