Sökning: "Chemical vapour deposition"
Visar resultat 16 - 20 av 75 avhandlingar innehållade orden Chemical vapour deposition.
16. Chemical vapour deposition of boron in a closed system
Sammanfattning : .... LÄS MER
17. Microfabrication of Tungsten, Molybdenum and Tungsten Carbide Rods by Laser-Assisted CVD
Sammanfattning : Thin films of refractory metals and carbides have been studied extensively over many years because of their wide range of application. The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD). These can result in the deposition of two-dimensional blanket or patterned thin films. LÄS MER
18. CVD and ALD of Group IV- and V-Oxides for Dielectric Applications
Sammanfattning : Due to the constantly decreasing dimensions of electronic devices, the conventional dielectric material in transistors and capacitors, SiO2, has to be replaced by a material with higher dielectric constant. Some of the most promising candidates are tantalum oxide,Ta2O5, zirconium oxide, ZrO2 and hafnium oxide, HfO2. LÄS MER
19. Theoretical modelling of thin film growth in the B-N system
Sammanfattning : In vapour phase deposition, the knowledge and control of homogeneous and heterogeneous reactions in connection to precursor design may lead to the deposition of the desired material; structure or phase. This thesis is a document attempting to increase the knowledge of film growth in the B-N system. LÄS MER
20. CVD and ALD in the Bi-Ti-O system
Sammanfattning : Bismuth titanate Bi4Ti3O12, is one of the bismuth based layered ferroelectric materials that is a candidate for replacing the lead based ferroelectric materials in for instance non-volatile ferroelectric random access memories (FRAM). This is due to the fact that the bismuth based ferroelectrics consists of pseudo perovskite units sandwiched in between bismuth oxide layers, which gives them a better fatigue nature. LÄS MER