Sökning: "Chemical Vapor Deposition CVD"
Visar resultat 1 - 5 av 77 avhandlingar innehållade orden Chemical Vapor Deposition CVD.
1. Vapor phase deposition of WO and WC
Sammanfattning : WO3 and WC are two compounds that are widely used for a number of different thin film applications. In this thesis, these compounds have been deposited using two different deposition methods: atomic layer epitaxy (ALE) and chemical vapor deposition (CVD). LÄS MER
2. Chemical vapor deposition of hard coatings : Development of W(C,N) coatings for cemented carbide and TiN deposition on a CoCrFeNi substrate
Sammanfattning : There is a constant need for cutting tool material development to be able to machine new materials and improve the metal cutting efficiency. Inserts of indexable cutting tools usually consist of WC-Co cemented carbide (cc) with μm thick layers of ceramic coatings. LÄS MER
3. A Quantum Chemical Exploration of SiC Chemical Vapor Deposition
Sammanfattning : SiC is a wide bandgap semiconductor with many attractive properties. It hasattracted particular attentions in the areas of power and sensor devices as wellas biomedical and biosensor applications. This is owing to its properties suchas large bandgap, high breakdown electric field, high thermal conductivitiesand chemically robustness. LÄS MER
4. Simulations of Silicon Carbide Chemical Vapor Deposition
Sammanfattning : Most of the modern electronics technology is based on the semiconducting material silicon. The increasing demands for smaller electronic devices with improved performance at lower costs drive the conventional silicon technology to its limits. LÄS MER
5. Thin Film Synthesis of Nickel Containing Compounds
Sammanfattning : Most electrical, magnetic or optical devices are today based on several, usually extremely thin layers of different materials. In this thesis chemical synthesis processes have been developed for growth of less stable and metastable layers, and even multilayers, of nickel containing compounds. LÄS MER
