Sökning: "Ambient pressure XPS"
Visar resultat 1 - 5 av 13 avhandlingar innehållade orden Ambient pressure XPS.
1. Synchrotron X-ray based characterization of technologically relevant III-V surfaces and nanostructures
Sammanfattning : Innovative design and materials are needed to satisfy the demand for efficient and scalable devices for electronic and opto-electronic applications, such as transistors, LEDs, and solar cells. Nanostructured III-V semiconductors are an appealing solution, combining the excellent functional properties of III-V materials with the flexibility typical of nanostructures, such as the nanowires (NWs) studied here. LÄS MER
2. Atomic Layer Deposition and Immobilised Molecular Catalysts Studied by In and Ex Situ Electron Spectroscopy
Sammanfattning : The research work that I describe in my thesis deals with three different heterogenisation approaches for synthesising a heterogeneous transition metal catalyst used for direct C-H activation reactions. The three heterogenisation approaches considered in my research are: (1) heterogenisation of a molecular catalyst on a polymer support using covalent bonds, (2) heterogenisation of a catalyst on a reduced graphene oxide (rGO) support using non-covalent interactions and (3) immobilisation of a catalyst on an inorganic surface using covalent bonds and encapsulation in an inorganic matrix. LÄS MER
3. Industrial Alloys Studied by Surface Sensitive Techniques
Sammanfattning : This thesis reports on surface studies of industrial materials whose importance for society manifests in the vast range of applications. In industrial materials alloying is performed in order to improve the parent material's physical and mechanical properties such as strength, corrosion and wear resistance, as well as high temperature performance in comparison to the pure metal. LÄS MER
4. Reaction Mechanisms and Dynamics in the Early Stage of High-κ Oxide Atomic Layer Deposition : Investigations by In Situ and Operando X-ray Photoemission Spectroscopy
Sammanfattning : Atomic layer deposition (ALD) is an outstanding deposition technique to deposit highly conformal and uniform thin films with atomic precision. In particular, ALD of transition metal oxide layers from metal amido complexes and water finds its way in several technological fields, including green energy devices and in the semiconductor industry. LÄS MER
5. Transient In Situ Studies on Supported Catalysts: CO2 Methanation and Methane Oxidation
Sammanfattning : This dissertation aims to increase the understanding of important steps in the catalytic CO2 hydrogenation and total methane oxidation reactions over supported noble metal catalysts. A general theme is the role of the metal oxide support for the catalytic reactions. LÄS MER