Sökning: "thin wall structures"
Visar resultat 1 - 5 av 30 avhandlingar innehållade orden thin wall structures.
1. Strategies for Reducing Vibrations during Milling of Thin-walled Components
Sammanfattning : Factors such as environmental requirements and fuel efficiency have pushed aerospace industry to develop reduced-weight engine designs and thereby light-weight and thin-walled components. As component wall thickness gets thinner and the mechanical structures weaker, the structure becomes more sensitive for vibrations during milling operations. LÄS MER
2. Hot-wall MOCVD for advanced GaN HEMT structures and improved p-type doping
Sammanfattning : The transition to energy efficient smart grid and wireless communication with improved capacity require the development and optimization of next generation semiconductor technologies and electronic device components. Indium nitride (InN), gallium nitride (GaN) and aluminum nitride (AlN) compounds and their alloys are direct bandgap semiconductors with bandgap energies ranging from 0. LÄS MER
3. Developing Process Design Methodology for Investment Cast Thin-Walled Structures
Sammanfattning : Components for engineering systems, such as gas turbines and jet engines operating at high temperature are usually produced in superalloys. The investment casting process is most widely used for manufacturing these components due to the ability of the process to produce parts with complex geometries to close dimensional tolerances. LÄS MER
4. Aspects of building geometry and powder characteristics in powder bed fusion
Sammanfattning : Additive manufacturing (AM) produces near-net-shaped parts directly from a 3D-CAD model in a layer-by-layer manner. One of the most common AM technique for fabricating metallic components is powder bed fusion (PBF). The PBF process has shown great potential in fabricating metallic parts with properties better or comparable to conventional methods. LÄS MER
5. Sputtered Carbon Nitride Thin Films
Sammanfattning : The relation between the growth conditions and the film structure and properties of reactively magnetron sputtered carbon nitride CNx (0 ≤ x ≤ 0.6) thin films has been studied. The growth of CNx films has been studied when varying the process parameters, such as substrate temperature, N2 (partial) pressure and ion flux. LÄS MER